Global High-k And ALD/CVD Metal Precursors Market Research Report - Industry Analysis, Size, Share, Growth, Trends and Forecast Till 2025

  • ID:PD001107
  • May 2019
  • Value Market Research
                          

High-k refers to dielectric materials which uses ALD and CVD metal precursors technique and technology to fabricate materials used to produce semiconductor devices. ALD atomic layer deposition is a technique used to produce thin films of standard quality. CVD chemical vapor deposition is a process used to make excellent quality and high performance devices. ALD and CVD use gas and chemical deposition techniques respectively to produce excellent dielectric and semiconductor devices.
 
ALD and CVD techniques are extensively used in various applications which include, semiconductor devices, microelectronics, LED dielectrics and in biomedical applications. Global high-k ALD/CVD metal precursors market is segmented on the basis of technology into capacitor, interconnect and high-k gates. Capacitor technology is the most extensively used technology due to its high performance and eminent applications in the electronic market.
 
Extensive use of ALD and CVD technology in the microelectronics field accompanied by growth of nanotechnology significantly surge rapid growth of this market. In addition, polymerization and microfabrication of semiconductor devices by CVD along with use of ALD in Dynamic RAMs and biomedical field will further augment the growth of this market. Efforts by vendors of this market in research and development of high-k metal precursors technology using ALD and CVD is expected to drive this marker for the forecast. High initial cost and complex designing techniques are major restraints of this market.
 
Asia Pacific is geography wise the most dominant region for the global high-k and ALD/CVD metal precursors market. Major regions like India China and Taiwan augment market growth of Asia Pacific region. Europe and North America are expected to show moderate growth for the forecast. Key participants in the global high-k and ALD/CVD metal precursors market are Dow Chemical, JSR Corporation, Adeka Corporation, Dynamic Network Factory Inc., NANMAT, Samsung Electronics, Air Liquide,  SAFC Hitech, Praxair and Air Products & Chemical.
 
Decision Databases is involved in providing research reports and company profiles in the global high-k and ALD/CVD metal precursors market in terms of revenue and output/volume. Market drivers, opportunities and restraints are thoroughly studied which influences the market. This study is further utilized for the overall analysis of the market. The high-k and ALD/CVD metal precursors market is segmented based on the global applications, geographic presence, by products and ingredients. We offer an inclusive category-specific market outlook. We provide access to a comprehensive collection of companies in the industry. The companies can strategize and execute business operations through our competitor analysis. Find the global industry analysis, market size, share, growth, and trends information in our high-k and ALD/CVD metal precursors profiles.
 
SEGMENTATIONS IN REPORT:
High-k And ALD/CVD Metal Precursors By Technology

  • Interconnect
  • Capacitor
  • High-K Gates
 
High-k And ALD/CVD Metal Precursors By Geography
  • North America
  • Europe
  • Asia Pacific
  • Latin America
  • Middle East And Africa
 
GLOSSARY:
High-k And ALD/CVD Metal Precursors: High-k refers to dielectric materials which uses ALD and CVD metal precursors technique and technology to fabricate materials used to produce semiconductor devices.

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  • Market Data Sheet With All Tables And Graphs
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  • Market Analysis
    • Drivers
    • Restraints
    • SWOT Analysis
    • Patent Analysis
  • Application Analysis
  • Product Analysis
  • Geography Analysis
  • Company Analysis
  • Competitive Landscape
  • Location Of Plants
  • Company Profiles

1.  INTRODUCTION TO THE HIGH-K AND ALD/CVD METAL PRECURSORS MARKET
 
2.  EXECUTIVE SUMMARY
 
3.  MARKET ANALYSIS OF HIGH-K AND ALD/CVD METAL PRECURSORS
 
4.  HIGH-K AND ALD/CVD METAL PRECURSORS MARKET ANALYSIS BY TECHNOLOGY

  • Interconnect
  • Capacitor
  • High-K Gates
 
5.  HIGH-K AND ALD/CVD METAL PRECURSORS MARKET ANALYSIS BY REGION
  • North America
  • Europe
  • Asia Pacific
  • Latin America
  • Middle East and Africa
 
6.  COMPETITIVE LANDSCAPE OF HIGH-K AND ALD/CVD METAL PRECURSORS COMPANIES
 
7. COMPANY PROFILES OF HIGH-K AND ALD/CVD METAL PRECURSORS INDUSTRY
  • Dow Chemical
  • JSR Corporation
  • Adeka Corporation
  • Dynamic Network Factory Inc.
  • NANMAT
  • Samsung Electronic
  • Air Liquide
  • SAFC Hitech
  • Praxair
  • Air Products & Chemical 

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Semiconductors And IT
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